Invention Grant
- Patent Title: Techniques for controlling vapor pressure of subject materials in vapor cells and related methods
-
Application No.: US17452302Application Date: 2021-10-26
-
Publication No.: US11750203B2Publication Date: 2023-09-05
- Inventor: Robert Lutwak
- Applicant: Microchip Technology Incorporated
- Applicant Address: US AZ Chandler
- Assignee: Microchip Technology Incorporated
- Current Assignee: Microchip Technology Incorporated
- Current Assignee Address: US AZ Chandler
- Agency: TraskBritt
- Main IPC: H03L7/26
- IPC: H03L7/26 ; G04F5/14 ; G05D16/04

Abstract:
Methods of using vapor cells may involve providing a vapor cell including a body defining a cavity within the body. At least a portion of at least one surface of the vapor cell within the cavity may include at least one pore having an average dimension of about 500 microns or less, as measured in a direction parallel to the at least one surface. A vapor pressure of a subject material within the cavity may be controlled utilizing the at least one pore by inducing an exposed surface of a subject material in a liquid state within the at least one pore to have a shape different than a shape the exposed surface of the subject material in a liquid state would have on a flat, nonporous surface.
Public/Granted literature
- US20230020554A1 TECHNIQUES FOR CONTROLLING VAPOR PRESSURE OF SUBJECT MATERIALS IN VAPOR CELLS AND RELATED METHODS Public/Granted day:2023-01-19
Information query