Invention Grant
- Patent Title: Additive for cement slurry for well and method for producing said additive, cement slurry for well, and cementing method for well
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Application No.: US17604093Application Date: 2020-04-07
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Publication No.: US11753572B2Publication Date: 2023-09-12
- Inventor: Satoru Murakami , Masaki Kimata , Isao Oota
- Applicant: Nissan Chemical Corporation
- Applicant Address: JP Tokyo
- Assignee: NISSAN CHEMICAL CORPORATION
- Current Assignee: NISSAN CHEMICAL CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP 19082615 2019.04.24
- International Application: PCT/JP2020/015614 2020.04.07
- International Announcement: WO2020/217966A 2020.10.29
- Date entered country: 2021-10-15
- Main IPC: C09K8/48
- IPC: C09K8/48 ; C04B14/06 ; C04B14/10 ; C04B18/02 ; C04B28/02 ; C04B40/00 ; E21B33/14 ; C04B103/24 ; C04B111/00 ; C04B111/40
Abstract:
An additive for a cement slurry for a well that is capable of suppressing the generation of free water and preventing flotation/separation of low-specific-gravity aggregate while securing sufficient cement strength even at a high temperature and a method for producing this additive are disclosed. The additive contains an aqueous dispersion of silica and a layered silicate.
Public/Granted literature
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