Invention Grant
- Patent Title: Semiconductor device and analyzing method thereof
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Application No.: US17246071Application Date: 2021-04-30
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Publication No.: US11754614B2Publication Date: 2023-09-12
- Inventor: Wei-Jhih Wang , Chia Wei Huang , Chia-Chia Kan , Yuan-Yao Chang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT LAW
- Agent Anthony King
- Main IPC: G01R31/26
- IPC: G01R31/26 ; H01L27/088 ; G01R19/165 ; H01L23/528 ; G01R19/10 ; H10B10/00

Abstract:
The present disclosure provides a method of analyzing a semiconductor device. The method includes providing a first transistor, a second transistor disposed adjacent to the first transistor, and a gate electrode common to the first transistor and the second transistor; connecting a power-supply voltage (Vdd) to the gate electrode to turn on the first transistor, determining a first threshold voltage (Vth) based on the power-supply voltage; switching the power-supply voltage to a ground voltage (Vss); connecting the ground voltage to the gate electrode to turn on the second transistor; and determining a second threshold voltage based on the ground voltage.
Public/Granted literature
- US20220349932A1 SEMICONDUCTOR DEVICE AND ANALYZING METHOD THEREOF Public/Granted day:2022-11-03
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