Invention Grant
- Patent Title: Extreme ultraviolet mask blank with multilayer absorber and method of manufacture
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Application No.: US17227717Application Date: 2021-04-12
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Publication No.: US11754917B2Publication Date: 2023-09-12
- Inventor: Vibhu Jindal
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: G03F1/24
- IPC: G03F1/24 ; G03F1/58 ; G03F1/52 ; G03F1/60
Abstract:
Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a multilayer stack of absorber layers on the capping layer, the multilayer stack of absorber layers including a plurality of absorber layer pairs.
Public/Granted literature
- US20220082925A1 Extreme Ultraviolet Mask Blank With Multilayer Absorber And Method Of Manufacture Public/Granted day:2022-03-17
Information query
