Invention Grant
- Patent Title: Resist composition and method of forming resist pattern
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Application No.: US17304622Application Date: 2021-06-23
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Publication No.: US11754922B2Publication Date: 2023-09-12
- Inventor: Masatoshi Arai , KhanhTin Nguyen
- Applicant: TOKYO OHKA KOGYO CO., LTD.
- Applicant Address: JP Kawasaki
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kawasaki
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Priority: JP 20117209 2020.07.07
- Main IPC: G03F7/039
- IPC: G03F7/039 ; C08F212/12 ; G03F7/038 ; C08F220/18 ; C08F220/28 ; C08F220/30 ; C08F212/14 ; C08F220/40 ; C08F212/34 ; C08F212/02

Abstract:
A resist composition containing a resin component (A1) having a constitutional unit derived from a compound represented by General Formula (a01-1). In the formula, W01 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, and Xt represents a group that forms a monocyclic or polycyclic alicyclic group together with Ct, Ra1 to Ra3 represents a hydrocarbon group having 1 to 10 carbon atoms, which may have a substituent, or a hydrogen atom, or two or more of Ra1 to Ra3 are bonded to each other to form an aliphatic ring, not all of Ra1 to Ra3 are hydrogen atoms, n represents 0 or 1
Public/Granted literature
- US20220019142A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN Public/Granted day:2022-01-20
Information query
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