Invention Grant
- Patent Title: Ferrimagnetic Heusler compounds with high spin polarization
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Application No.: US17318998Application Date: 2021-05-12
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Publication No.: US11756578B2Publication Date: 2023-09-12
- Inventor: Jaewoo Jeong , Sergey Faleev , Panagiotis Charilaos Filippou , Yari Ferrante , Stuart Stephen Papworth Parkin , Mahesh Samant
- Applicant: Samsung Electronics Co., Ltd. , INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: KR NY Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: Lewis Roca Rothgerber Christie LLP
- Main IPC: G11B5/39
- IPC: G11B5/39 ; G11C11/16 ; G11C19/08 ; H01F1/03 ; H01F10/193 ; H01F10/30 ; H01F10/32 ; H01F41/30 ; H10N50/85 ; H10N50/10 ; H10N50/01

Abstract:
A magnetic device and method for providing the magnetic device are disclosed. The magnetic device includes a multilayer structure and a magnetic layer. The multilayer structure includes alternating layers of A and E. A includes a first material. The first material includes at least one of Co, Ru, or Ir. The first material may include an IrCo alloy. E includes at least one other material that includes Al. The other material(s) may include an alloy selected from AlGa, AlSn, AlGe, AlGaGe, AlGaSn, AlGeSn, and AlGaGeSn. A composition of the multilayer structure is represented by A1-xEx, where x is at least 0.45 and not more than 0.55. The magnetic layer includes an Al-doped Heusler compound. The magnetic layer shares an interface with the multilayer structure.
Public/Granted literature
- US20220262555A1 FERRIMAGNETIC HEUSLER COMPOUNDS WITH HIGH SPIN POLARIZATION Public/Granted day:2022-08-18
Information query
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