Invention Grant
- Patent Title: Post-discharge plasma coating device for wired substrates
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Application No.: US16333827Application Date: 2017-09-08
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Publication No.: US11756770B2Publication Date: 2023-09-12
- Inventor: Simon Bulou , Patrick Choquet , Thomas Gaulain , Mathieu Gerard
- Applicant: LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST)
- Applicant Address: LU Esch-sur-Alzette
- Assignee: Luxembourg Institute of Science and Technology (LIST)
- Current Assignee: Luxembourg Institute of Science and Technology (LIST)
- Current Assignee Address: LU Esh-sur-Alzette
- Agency: Sandberg Phoenix & von Gontard PC
- Priority: LU 222 2016.09.15
- International Application: PCT/EP2017/072635 2017.09.08
- International Announcement: WO2018/050562A 2018.03.22
- Date entered country: 2019-03-15
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C16/54 ; C23C16/452 ; C23C16/503 ; H05H1/24

Abstract:
A post-discharge plasma coating device for a wired substrate comprising an inner tubular electrode on an inner tubular wall for receiving the substrate and a precursor moving axially in a working direction; an outer tubular electrode coaxial with, and surrounding, the inner tubular electrode. The inner and outer electrodes are configured to be supplied with an electrical power source for producing a plasma when a plasma gas is supplied between the electrodes and is thereby excited, the plasma excited gas flowing axially in the working direction and reacting with the precursor in a coating area at the end of the inner tubular wall in the direction. The inner tubular wall extends axially towards the coating area at least until, in various instances beyond, the end of the outer electrode, in the working direction and at least one dielectric tubular wall extends axially between the inner tubular electrode and the outer tubular electrode.
Public/Granted literature
- US20190259577A1 POST-DISCHARGE PLASMA COATING DEVICE FOR WIRED SUBSTRATES Public/Granted day:2019-08-22
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