Invention Grant
- Patent Title: Wafer manufacturing method and laminated device chip manufacturing method
-
Application No.: US17453543Application Date: 2021-11-04
-
Publication No.: US11756831B2Publication Date: 2023-09-12
- Inventor: Youngsuk Kim , Byeongdeck Jang , Akihito Kawai , Shunsuke Teranishi
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain Ltd.
- Priority: JP 20191857 2020.11.18
- Main IPC: H01L21/78
- IPC: H01L21/78 ; H01L21/683

Abstract:
A wafer manufacturing method includes a wafer preparing step of preparing a wafer including a semiconductor device formed in each of a plurality of regions demarcated by a plurality of streets intersecting each other, a removing step of removing, from the wafer, a defective device region including a semiconductor device determined to be a defective product among a plurality of the semiconductor devices formed in the wafer, a support substrate fixing step of fixing the wafer to a support substrate, and a fitting step of fitting, into a removed region formed by removing the defective device region from the wafer, a device chip including a semiconductor device as a non-defective product having same functions as those of the semiconductor device determined to be a defective product and having a size capable of being fitted into the removed region, and fixing the device chip to the support substrate.
Public/Granted literature
- US20220157659A1 WAFER MANUFACTURING METHOD AND LAMINATED DEVICE CHIP MANUFACTURING METHOD Public/Granted day:2022-05-19
Information query
IPC分类: