Invention Grant
- Patent Title: Copper foil with glass carrier and production method therefor
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Application No.: US16971154Application Date: 2019-02-13
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Publication No.: US11756845B2Publication Date: 2023-09-12
- Inventor: Yoshinori Matsuura , Takenori Yanai , Toshimi Nakamura
- Applicant: MITSUI MINING & SMELTING CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: MITSUI MINING & SMELTING CO., LTD.
- Current Assignee: MITSUI MINING & SMELTING CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: GREENBLUM & BERNSTEIN, P.L.C.
- Priority: JP 18027929 2018.02.20
- International Application: PCT/JP2019/005111 2019.02.13
- International Announcement: WO2019/163605A 2019.08.29
- Date entered country: 2020-08-19
- Main IPC: B32B15/04
- IPC: B32B15/04 ; B32B17/06 ; H01L23/13 ; H01L21/48 ; H01L23/15 ; H01L23/498 ; H05K1/09 ; C03C17/09 ; C03C17/36 ; C23C14/18

Abstract:
A glass carrier-attached copper foil is provided that can achieve a desired circuit mounting board that reduces separation of a copper layer at the cut edge even if the copper foil is downsized to dimensions enabling mount of a circuit, and has an intended circuit pattern with a fine pitch. The glass carrier-attached copper foil includes a glass carrier, a release layer, and a copper layer with a thickness of 0.1 to 3.0 μm. The glass carrier has, at least on its surface having the copper layer thereon, a plurality of flat regions each having a maximum height Rz of less than 1.0 μm as measured in accordance with JIS B 0601-2001 and a rough region having a maximum height Rz of 1.0 to 30.0 μm as measured in accordance with JIS B 0601-2001. The rough region has a pattern of lines that define the flat regions.
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