Invention Grant
- Patent Title: Method of fabricating package structure
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Application No.: US17586800Application Date: 2022-01-28
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Publication No.: US11756855B2Publication Date: 2023-09-12
- Inventor: Chih-Hao Chen , Chin-Fu Kao , Li-Hui Cheng , Szu-Wei Lu
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- The original application number of the division: US16745338 2020.01.17
- Main IPC: H01L23/367
- IPC: H01L23/367 ; H01L23/31 ; H01L23/00 ; H01L21/48 ; H01L21/683 ; H01L21/56

Abstract:
A structure includes a circuit substrate, a device, a metal layer, a lid and a thermal interface material layer. The device is disposed on and electrically connected to the circuit substrate. The device includes at least one semiconductor die laterally encapsulated by an insulating encapsulation. The metal layer is covering a back surface of the at least one semiconductor die and the insulating encapsulation. The lid is disposed on the circuit substrate, and the lid is adhered to the metal layer through the thermal interface material layer.
Public/Granted literature
- US20220148940A1 METHOD OF FABRICATING PACKAGE STRUCTURE Public/Granted day:2022-05-12
Information query
IPC分类: