Invention Grant
- Patent Title: Three-dimensional memory device with deposited semiconductor plugs and methods for forming the same
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Application No.: US16455626Application Date: 2019-06-27
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Publication No.: US11758722B2Publication Date: 2023-09-12
- Inventor: Li Hong Xiao
- Applicant: YANGTZE MEMORY TECHNOLOGIES CO., LTD.
- Applicant Address: CN Wuhan
- Assignee: YANGTZE MEMORY TECHNOLOGIES CO., LTD.
- Current Assignee: YANGTZE MEMORY TECHNOLOGIES CO., LTD.
- Current Assignee Address: CN Wuhan
- Agency: BAYES PLLC
- Main IPC: H10B43/27
- IPC: H10B43/27 ; H10B41/10 ; H10B41/27 ; H10B41/35 ; H10B43/10 ; H10B43/35

Abstract:
Embodiments of 3D memory devices and the fabrication methods to form the 3D memory devices are provided. A 3D memory device includes a substrate, a memory deck, and a memory string. The memory deck includes a plurality of interleaved conductor layers and dielectric layers on the substrate. The memory string extends vertically through the memory deck. A bottom conductor layer of the plurality of interleaved conductor layers and dielectric layers can intersect with and contact the memory string.
Public/Granted literature
- US20200328225A1 THREE-DIMENSIONAL MEMORY DEVICE WITH DEPOSITED SEMICONDUCTOR PLUGS AND METHODS FOR FORMING THE SAME Public/Granted day:2020-10-15
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