Invention Grant
- Patent Title: Magnetic memory element incorporating dual perpendicular enhancement layers
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Application No.: US17871147Application Date: 2022-07-22
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Publication No.: US11758822B2Publication Date: 2023-09-12
- Inventor: Zihui Wang , Yiming Huai
- Applicant: Avalanche Technology, Inc.
- Applicant Address: US CA Fremont
- Assignee: Avalanche Technology, Inc.
- Current Assignee: Avalanche Technology, Inc.
- Current Assignee Address: US CA Fremont
- Agent Bing K. Yen
- Main IPC: H10N50/10
- IPC: H10N50/10 ; G11C11/15 ; G11C11/16 ; H01F10/32 ; H01F41/30 ; H01L29/66 ; H10B61/00 ; H10N50/80 ; H10N50/85 ; B82Y40/00

Abstract:
The present invention is directed to a magnetic memory element including a magnetic free layer structure incorporating two magnetic free layers separated by a perpendicular enhancement layer (PEL) and having a variable magnetization direction substantially perpendicular to layer planes thereof; an insulating tunnel junction layer formed adjacent to the magnetic free layer structure; a magnetic reference layer structure formed adjacent to the insulating tunnel junction layer opposite the magnetic free layer structure; an anti-ferromagnetic coupling layer formed adjacent to the magnetic reference layer structure; and a magnetic fixed layer formed adjacent to the anti-ferromagnetic coupling layer. The magnetic reference layer structure includes first, second, and third magnetic reference layers separated by two PELs and having a first invariable magnetization direction substantially perpendicular to layer planes thereof. The magnetic fixed layer has a second invariable magnetization direction substantially opposite to the first invariable magnetization direction.
Public/Granted literature
- US20220376172A1 Magnetic Memory Element Incorporating Dual Perpendicular Enhancement Layers Public/Granted day:2022-11-24
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