Method of manufacturing magnetoresistive random access memory device
Abstract:
A magnetoresistive random access memory (MRAM) device and a method of manufacturing the same, the device including a substrate; a memory unit including a lower electrode, a magnetic tunnel junction (MTJ) structure, and an upper electrode sequentially stacked on the substrate; a passivation pattern on a sidewall of the memory unit; a via on the memory unit and contacting the upper electrode; and a wiring on the via and contacting the via, wherein a center portion of the upper electrode protrudes from a remaining portion of the upper electrode in a vertical direction substantially perpendicular to an upper surface of the substrate.
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