Invention Grant
- Patent Title: Triarylmethane compounds
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Application No.: US16968106Application Date: 2019-02-01
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Publication No.: US11760712B2Publication Date: 2023-09-19
- Inventor: Karl Reuter , Vasyl Andrushko , Mark Kantor , Florian Stolz , Munenori Shiratake , Kentaro Ishihara , Koji Hirose , Shinya Ikeda , Noriyuki Kato , Mitsuteru Kondo , Shoko Murata , Kensuke Oshima
- Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Viksnins Harris Padys Malen LLP
- Priority: EP 156161 2018.02.09
- International Application: PCT/EP2019/052506 2019.02.01
- International Announcement: WO2019/154730A 2019.08.15
- Date entered country: 2020-08-06
- Main IPC: C07C43/23
- IPC: C07C43/23 ; C08G64/06 ; C08G64/30 ; G02B1/04 ; C08G63/193 ; C08L69/00

Abstract:
The present invention relates to triarylmethane compounds of the formula (I), which suitable as monomers for preparing thermoplastic resins having beneficial optical properties and which can be used for producing optical devices. R1, R2 are e.g. hydrogen; Y is an alkylene group having 2, 3 or 4 carbon atoms, Ar is selected from mono- or polycyclic aryl and mono- or polycyclic hetaryl; X1, X2, X3, X4 are CH, C—Rx or N, provided that in each ring at most two of X1, X2, X3, X4 are N; Rx is e.g. halogen, CN or CH═CH2. The invention also relates to thermoplastic resins comprising a polymerized unit of the compound of formula (I).
Public/Granted literature
- US20210371367A1 TRIARYLMETHANE COMPOUNDS Public/Granted day:2021-12-02
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