Invention Grant
- Patent Title: Automated analysis device
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Application No.: US16964798Application Date: 2019-01-28
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Publication No.: US11761972B2Publication Date: 2023-09-19
- Inventor: Tooru Inaba , Ruochi Hsu , Shinya Matsuoka , Takeshi Yokokawa , Daisuke Ebihara
- Applicant: Hitachi High-Tech Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Tech Corporation
- Current Assignee: Hitachi High-Tech Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP 18028207 2018.02.20
- International Application: PCT/JP2019/002714 2019.01.28
- International Announcement: WO2019/163431A 2019.08.29
- Date entered country: 2020-07-24
- Main IPC: G01N35/04
- IPC: G01N35/04

Abstract:
The objective of the present disclosure is to provide a technique for reducing a quantity of magnetic particles remaining on a reaction vessel wall surface in a cleaning step for reducing, in a stepwise manner, an amount of a magnetic particle solution in the reaction vessel. The automated analysis device according to the present disclosure causes an agitating mechanism to operate in such a way that a magnetic substance remaining on the wall surface of the vessel in the previous cleaning step is captured by a cleaning solution in the next cleaning step.
Public/Granted literature
- US20210063424A1 Automated Analysis Device Public/Granted day:2021-03-04
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