• Patent Title: Device and method for producing master diffraction grating
  • Application No.: US16980425
    Application Date: 2018-06-20
  • Publication No.: US11762135B2
    Publication Date: 2023-09-19
  • Inventor: Yuki Oue
  • Applicant: Shimadzu Corporation
  • Applicant Address: JP Kyoto
  • Assignee: Shimadzu Corporation
  • Current Assignee: Shimadzu Corporation
  • Current Assignee Address: JP Kyoto
  • Agency: JCIPRNET
  • International Application: PCT/JP2018/023453 2018.06.20
  • International Announcement: WO2019/244274A 2019.12.26
  • Date entered country: 2020-09-14
  • Main IPC: G02B5/18
  • IPC: G02B5/18 G03F7/00 G03H1/22
Device and method for producing master diffraction grating
Abstract:
A device for producing a master diffraction grating includes a light source unit and a reflecting member 11. The light source unit forms a first interference fringe by irradiating a substrate surface of a master substrate 101 with light. The reflecting member 11 reflects the light from the light source unit reflected on the substrate surface of the master substrate 101 and guides the light again to the substrate surface side to form a second interference fringe. A resist pattern based on the first interference fringe and the second interference fringe is formed on the substrate surface of the master substrate 101.
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