Invention Grant
- Patent Title: Onium salt compound, chemically amplified resist composition and patterning process
-
Application No.: US17087807Application Date: 2020-11-03
-
Publication No.: US11762287B2Publication Date: 2023-09-19
- Inventor: Takayuki Fujiwara , Kenichi Oikawa , Tomohiro Kobayashi , Masahiro Fukushima
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: WHDA, LLP
- Priority: JP 19209432 2019.11.20
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/038 ; G03F7/039 ; C07C69/92 ; C07C381/12 ; C07D333/76 ; C07C25/18 ; C07C69/96 ; C08F220/28 ; C08F220/18 ; C08F212/14
Abstract:
An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits dissolution contrast, acid diffusion suppressing effect, and excellent lithography performance factors such as CDU, LWR and sensitivity.
Public/Granted literature
- US20210149301A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS Public/Granted day:2021-05-20
Information query
IPC分类:
