Invention Grant
- Patent Title: Exposure apparatus and method of manufacturing article
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Application No.: US17858263Application Date: 2022-07-06
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Publication No.: US11762299B2Publication Date: 2023-09-19
- Inventor: Keiji Emoto , Mamoru Kaneishi
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Carter, DeLuca & Farrell LLP
- Priority: JP 21115831 2021.07.13
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/00

Abstract:
The present invention provides an exposure apparatus for performing scanning exposure on each of a plurality of shot regions in a substrate, comprising: a stage configured to hold the substrate; a driver configured to drive the stage; and a controller configured to control the scanning exposure on each of the plurality of shot regions while controlling the driver in accordance with a driving profile, wherein the driving profile includes a first section in which the stage is driven at a constant acceleration in a first direction, a second section in which the stage is driven at a constant acceleration in a second direction opposite to the first direction, and a connection section connecting the first section and the second section, and a period in which the scanning exposure is performed includes at least a part of the connection section.
Public/Granted literature
- US20230013155A1 EXPOSURE APPARATUS AND METHOD OF MANUFACTURING ARTICLE Public/Granted day:2023-01-19
Information query
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