Invention Grant
- Patent Title: Magnetoresistance effect element
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Application No.: US17412394Application Date: 2021-08-26
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Publication No.: US11763841B2Publication Date: 2023-09-19
- Inventor: Tomoyuki Sasaki
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP 15071410 2015.03.31
- The original application number of the division: US16819373 2020.03.16
- Main IPC: H01L29/82
- IPC: H01L29/82 ; G11B5/39 ; H01L27/105 ; H10B61/00 ; H10N50/10 ; H10N50/85 ; G11C11/16 ; H01F10/193 ; H01F1/40

Abstract:
A magnetoresistance effect element has a first ferromagnetic metal layer, a second ferromagnetic metal layer, and a tunnel barrier layer that is sandwiched between the first and second ferromagnetic metal layers, the tunnel barrier layer is expressed by a chemical formula of AB2Ox, and has a spinel structure in which cations are arranged in a disordered manner, A represents a divalent cation that is either Mg or Zn, and B represents a trivalent cation that includes a plurality of elements selected from the group consisting of Al, Ga, and In.
Public/Granted literature
- US20210383828A1 MAGNETORESISTANCE EFFECT ELEMENT Public/Granted day:2021-12-09
Information query
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