Invention Grant
- Patent Title: Method for adjusting a laser beam, apparatus for providing an adjusted laser beam and optical arrangement
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Application No.: US17478975Application Date: 2021-09-20
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Publication No.: US11764538B2Publication Date: 2023-09-19
- Inventor: Jonathan Mueller
- Applicant: TRUMPF Lasersystems for Semiconductor Manufacturing GmbH
- Applicant Address: DE Ditzingen
- Assignee: TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING GMBH
- Current Assignee: TRUMPF LASERSYSTEMS FOR SEMICONDUCTOR MANUFACTURING GMBH
- Current Assignee Address: DE Ditzingen
- Agency: LEYDIG VOIT & MAYER LTD.
- Main IPC: H01S3/13
- IPC: H01S3/13 ; H01S3/10 ; H01S3/00 ; H01S3/106 ; H01S3/16 ; H01S3/223 ; H01S3/225

Abstract:
A method for adjusting a laser beam includes, following passage of the laser beam through a beam-shaping device, measuring, via a detector of a detector device, a beam profile of the laser beam. The method further includes determining a beam quality property of the laser beam based on the measured beam profile and altering an adjustable optical unit for modifying at least one property of the laser beam prior to the entry into the beam-shaping device. For adjusting the laser beam, the adjustable optical unit is altered based on the determined beam quality property.
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