Invention Grant
- Patent Title: Striped pattern image examination support apparatus, striped pattern image examination support method, and program
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Application No.: US17323315Application Date: 2021-05-18
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Publication No.: US11766192B2Publication Date: 2023-09-26
- Inventor: Masanori Hara
- Applicant: NEC Corporation
- Applicant Address: JP Tokyo
- Assignee: NEC CORPORATION
- Current Assignee: NEC CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP 16209502 2016.10.26
- Main IPC: A61B5/1172
- IPC: A61B5/1172 ; G06V40/12

Abstract:
A striped pattern image examination support apparatus includes a feature extraction part, a central line collation part, and a display part. The feature extraction part extracts, from each of a first striped pattern image and a second striped pattern image, at least central lines and feature points, as a feature of each of the first striped pattern image and the second striped pattern image. The central line collation part performs collation of the respective central lines of the first striped pattern image and the second striped pattern image, and computes corresponding central lines between the first striped pattern image and the second striped pattern image. The display part determines a display form of each of the central lines based on the computed corresponding central lines and superimposes and displays the central lines on each of the first striped pattern image and the second striped pattern image, according to the determined display form.
Public/Granted literature
Information query