Invention Grant
- Patent Title: Method for machining sputtering target, apparatus for machining sputtering target, sputtering target, and method for producing sputtering target product
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Application No.: US16484242Application Date: 2018-02-09
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Publication No.: US11766726B2Publication Date: 2023-09-26
- Inventor: Masahiro Fujita , Koji Nishioka
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP 17027098 2017.02.16
- International Application: PCT/JP2018/004579 2018.02.09
- International Announcement: WO2018/151037A 2018.08.23
- Date entered country: 2019-08-07
- Main IPC: H01J37/34
- IPC: H01J37/34 ; B23C3/12 ; C23C14/34

Abstract:
A method for machining a sputtering target that includes a sputtering surface, an opposing surface opposite to the sputtering surface, and an outer peripheral surface being between the sputtering surface and the opposing surface comprises the steps of: fixing the sputtering target on a fixing table by mounting the sputtering surface or the opposing surface of the sputtering target on the fixing table; and cutting the outer peripheral surface of the sputtering target by a cutting tool while rotating the cutting tool along a circumferential direction of the outer peripheral surface of the sputtering target.
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