- Patent Title: Copper particle mixture and method for manufacturing same, copper particle mixture dispersion, ink containing copper particle mixture, method for storing copper particle mixture, and method for sintering copper particle mixture
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Application No.: US16604046Application Date: 2018-04-05
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Publication No.: US11767443B2Publication Date: 2023-09-26
- Inventor: Hideya Kawasaki
- Applicant: THE SCHOOL CORPORATION KANSAI UNIVERSITY
- Applicant Address: JP Suita
- Assignee: THE SCHOOL CORPORATION KANSAI UNIVERSITY
- Current Assignee: THE SCHOOL CORPORATION KANSAI UNIVERSITY
- Current Assignee Address: JP Suita
- Agency: WHDA, LLP
- Priority: JP 17080971 2017.04.14
- International Application: PCT/JP2018/014637 2018.04.05
- International Announcement: WO2018/190246A 2018.10.18
- Date entered country: 2019-12-20
- Main IPC: B22F9/24
- IPC: B22F9/24 ; B22F1/054 ; B22F1/0545 ; B22F1/052 ; B22F1/102 ; C09D11/52 ; C09D11/037 ; B22F1/103

Abstract:
A copper particle mixture ensures suppression of copper oxidation and high dispersibility, and that can be sintered at a low temperature in a short period of time can suitably be used for a conductive copper ink material. The copper particle mixture contains copper fine particle A and copper nanoparticle B, the copper fine particle A having an average particle diameter of 0.1 μm to 5 μm, and being coated with at least one dicarboxylic acid selected from the group consisting of malonic acid and oxalic acid, the copper nanoparticle B comprising a central portion comprising a copper single crystal, and a protective layer surrounding the central portion, and having an average particle diameter of 1 nm to 100 nm, and the protective layer of the copper nanoparticle B containing at least one member selected from the group consisting of C3-6 primary alcohols, C3-6 secondary alcohols, and derivatives thereof.
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