Invention Grant
- Patent Title: Detachable atomic layer deposition apparatus for powders
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Application No.: US17334773Application Date: 2021-05-30
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Publication No.: US11767591B2Publication Date: 2023-09-26
- Inventor: Jing-Cheng Lin , Jung-Hua Chang , Chia-Cheng Ku
- Applicant: SKY TECH INC.
- Applicant Address: TW Hsinchu County
- Assignee: SKY TECH INC.
- Current Assignee: SKY TECH INC.
- Current Assignee Address: TW Hsinchu County
- Agency: HDLS IPR SERVICES
- Agent Chun-Ming Shih
- Priority: TW 9134655 2020.10.06
- Main IPC: C23C16/455
- IPC: C23C16/455 ; C23C16/44

Abstract:
A detachable atomic layer deposition apparatus for powders is disclosed, which includes a vacuum chamber, a shaft sealing device, and a driving unit. The driving unit is connected to the shaft sealing device. The vacuum chamber is fixed to one end of the shaft sealing device via at least one fixing member. The driving unit drives the vacuum chamber to rotate via the shaft sealing device to agitate the powders in a reaction space of the vacuum chamber to facilitate the formation of thin films with uniform thickness on the surface of the powders. In addition, the vacuum chamber can be removed from the shaft sealing device for users to take out the powders from the vacuum chamber and clean the vacuum chamber, thereby improving the convenience in usage.
Public/Granted literature
- US20220106686A1 DETACHABLE ATOMIC LAYER DEPOSITION APPARATUS FOR POWDERS Public/Granted day:2022-04-07
Information query
IPC分类: