Invention Grant
- Patent Title: Chemical liquid, chemical liquid container, and method for treating substrate
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Application No.: US18158061Application Date: 2023-01-23
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Publication No.: US11767595B2Publication Date: 2023-09-26
- Inventor: Atsushi Mizutani
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP 20130455 2020.07.31
- Main IPC: C23F1/30
- IPC: C23F1/30

Abstract:
The present invention provides a chemical liquid that has an excellent ruthenium dissolving ability and leaves small amounts of residual ruthenium and sodium, a chemical liquid container, and a method for treating a substrate. The chemical liquid according to an embodiment of the present invention is a chemical liquid used for removing a ruthenium-containing substance on a substrate. The chemical liquid contains hypochlorous acid or a salt thereof and bromic acid or a salt thereof, in which a content of the hypochlorous acid or a salt thereof is 0.1% to 9.0% by mass with respect to a total mass of the chemical liquid, and a content of the bromic acid or a salt thereof is 0.001 to 15.0 ppm by mass with respect to the total mass of the chemical liquid.
Public/Granted literature
- US20230160072A1 CHEMICAL LIQUID, CHEMICAL LIQUID CONTAINER, AND METHOD FOR TREATING SUBSTRATE Public/Granted day:2023-05-25
Information query
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