Invention Grant
- Patent Title: Gate-all-around floating-gate field effect memory transistor constructions including ferroelectric gate insulator
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Application No.: US17501464Application Date: 2021-10-14
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Publication No.: US11769542B2Publication Date: 2023-09-26
- Inventor: Kamal M. Karda , Chandra Mouli , Durai Vishak Nirmal Ramaswamy , F. Daniel Gealy
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc
- Current Assignee: Micron Technology, Inc
- Current Assignee Address: US ID Boise
- Agency: Wells St. John P.S.
- The original application number of the division: US16011771 2018.06.19
- Main IPC: G11C11/22
- IPC: G11C11/22 ; H01L29/788 ; H01L29/423 ; H01L29/78 ; H01L29/66 ; H10B51/30

Abstract:
A field effect transistor construction includes a semiconductive channel core. A source/drain region is at opposite ends of the channel core. A gate is proximate a periphery of the channel core. A gate insulator is between the gate and the channel core. The gate insulator has local regions radially there-through that have different capacitance at different circumferential locations relative to the channel core periphery. Additional constructions, and methods, are disclosed.
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