Invention Grant
- Patent Title: Trench capacitor profile to decrease substrate warpage
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Application No.: US17370067Application Date: 2021-07-08
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Publication No.: US11769792B2Publication Date: 2023-09-26
- Inventor: Hsin-Li Cheng , Jyun-Ying Lin , Alexander Kalnitsky , Shih-Fen Huang , Shu-Hui Su , Ting-Chen Hsu , Tuo-Hsin Chien , Felix Ying-Kit Tsui , Shi-Min Wu , Yu-Chi Chang
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: H01L29/94
- IPC: H01L29/94 ; H01L23/00 ; H01L29/66 ; H01L21/02 ; H01L21/3213 ; H01L21/764 ; H01L49/02

Abstract:
Various embodiments of the present disclosure are directed towards an integrated circuit (IC) including a substrate comprising sidewalls that define a trench. A capacitor comprising a plurality of conductive layers and a plurality of dielectric layers that define a trench segment is disposed within the trench. A width of the trench segment continuously increases from a front-side surface of the substrate in a direction towards a bottom surface of the trench.
Public/Granted literature
- US20210343881A1 TRENCH CAPACITOR PROFILE TO DECREASE SUBSTRATE WARPAGE Public/Granted day:2021-11-04
Information query
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