Invention Grant
- Patent Title: Photodetector and method for forming the same
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Application No.: US17864725Application Date: 2022-07-14
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Publication No.: US11769846B2Publication Date: 2023-09-26
- Inventor: Chan-Hong Chern
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: H01L31/0352
- IPC: H01L31/0352 ; H01L31/18 ; H01L31/0224 ; H01L31/105

Abstract:
A photodetector is provided. The photodetector includes a bottom electrode region in a semiconductor layer, a light absorption material in the semiconductor layer, and a first buffer layer sandwiched between a bottom surface of the light absorption material and the semiconductor layer. The first buffer layer includes, from bottom to top, a first Si layer, a first SiGe layer, a second Si layer, and a second SiGe layer. A first atomic percentage of Ge in the first SiGe layer is less than a second atomic percentage of Ge in the second SiGe layer. The photodetector further includes a top electrode region over the light absorption material.
Public/Granted literature
- US20220352399A1 PHOTODETECTOR AND METHOD FOR FORMING THE SAME Public/Granted day:2022-11-03
Information query
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