Invention Grant
- Patent Title: Lithography system bandwidth control
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Application No.: US17064331Application Date: 2020-10-06
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Publication No.: US11769982B2Publication Date: 2023-09-26
- Inventor: Tanuj Aggarwal
- Applicant: Cymer, LLC
- Applicant Address: US CA San Diego
- Assignee: Cymer, LLC
- Current Assignee: Cymer, LLC
- Current Assignee Address: US CA San Diego
- Agency: DiBerardino McGovern IP Group LLC
- Main IPC: H01S3/10
- IPC: H01S3/10 ; H01S3/13 ; G03F7/00 ; H01S3/00 ; H01S3/225 ; H01S3/134 ; H01S3/23
Abstract:
Methods and apparatus for controlling laser firing timing and hence bandwidth in a laser capable of operating at any one of multiple repetition rates.
Public/Granted literature
- US20210021094A1 LITHOGRAPHY SYSTEM BANDWIDTH CONTROL Public/Granted day:2021-01-21
Information query
