Invention Grant
- Patent Title: Film production method
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Application No.: US17178890Application Date: 2021-02-18
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Publication No.: US11770941B2Publication Date: 2023-09-26
- Inventor: Satoshi Kobayashi , Makoto Anryu , Mika Shirasaki , Hiroyuki Hayasaka , Toshiaki Sasada
- Applicant: Sumitomo Chemical Company, Limited
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Panitch Schwarze Belisario & Nadel LLP
- Priority: JP 16014050 2016.01.28
- The original application number of the division: US16069571
- Main IPC: H10K50/11
- IPC: H10K50/11 ; H10K50/00 ; H10K50/15 ; H10K50/16 ; H10K71/15 ; H05B33/10 ; C09K11/06

Abstract:
A method of producing a film having excellent external quantum efficiency when used in a light emitting layer of a light emitting device is provided. A method of film production includes preparing an ink containing a specific metal complex, storing the ink for 3 days or more under light shielding, and forming a film by using the stored ink. The total content of metal complexes having a molecular weight larger by 16, 32 or 48 than that of the specific metal complex according to an area percentage value determined by liquid chromatography is 0.6 or less when the content of the specific metal complex is taken as 100.
Public/Granted literature
- US20210184149A1 FILM PRODUCTION METHOD Public/Granted day:2021-06-17
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