- Patent Title: Method for disposing substrate and method for manufacturing article
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Application No.: US17062214Application Date: 2020-10-02
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Publication No.: US11774850B2Publication Date: 2023-10-03
- Inventor: Naoki Funabashi
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc., IP Division
- Priority: JP 16109653 2016.06.01
- The original application number of the division: US15607154 2017.05.26
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F9/00 ; H01L21/67 ; H01L21/68

Abstract:
A method of disposing a substrate on a holding unit using a pattern forming apparatus which forms a pattern on the substrate, the pattern forming apparatus comprising: a stage, the holding unit removably attached to the stage and configured to suck and hold the substrate, an optical system, and configured to detect an alignment mark of the substrate from a suction surface side of the substrate, the optical system having plural optical elements, and a detection unit configured to detect a reference mark for measuring a position of a detection field of the optical system, the method comprising: detecting a position of the reference mark, and disposing the substrate on the holding unit using the detected position of the reference mark so that the alignment mark of the substrate detected from the suction surface side of the substrate by the optical system is disposed in the detection field.
Public/Granted literature
- US20210033967A1 METHOD FOR DISPOSING SUBSTRATE AND METHOD FOR MANUFACTURING ARTICLE Public/Granted day:2021-02-04
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