Invention Grant
- Patent Title: Plasma source with ceramic electrode plate
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Application No.: US17097492Application Date: 2020-11-13
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Publication No.: US11776793B2Publication Date: 2023-10-03
- Inventor: Robert B. Moore , Jared Ahmad Lee , Marc David Shull , Tsutomu Tanaka , Alexander V. Garachtchenko , Dmitry A. Dzilno
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01J37/32
- IPC: H01J37/32
Abstract:
A plasma source assembly for use with a substrate processing chamber is described. The assembly includes a ceramic lower plate with a plurality of apertures formed therein. A method of processing a substrate in a substrate processing chamber including the plasma source assembly is also described.
Public/Granted literature
- US20220157569A1 Plasma Source With Ceramic Electrode Plate Public/Granted day:2022-05-19
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