Invention Grant
- Patent Title: Vertical interconnection structure and manufacturing method thereof, packaged chip, and chip packaging method
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Application No.: US17459919Application Date: 2021-08-27
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Publication No.: US11776820B2Publication Date: 2023-10-03
- Inventor: Xiaoyun Wei , Yong Yang , Chaojun Deng
- Applicant: HUAWEI TECHNOLOGIES CO., LTD.
- Applicant Address: CN Guangdong
- Assignee: HUAWEI TECHNOLOGIES CO., LTD.
- Current Assignee: HUAWEI TECHNOLOGIES CO., LTD.
- Current Assignee Address: CN Guangdong
- Agency: WOMBLE BOND DICKINSON (US) LLP
- Priority: CN 2011066391.9 2020.09.30 CN 2011455250.6 2020.12.10
- Main IPC: H01L21/48
- IPC: H01L21/48 ; H01L21/56 ; H01L21/683 ; H01L23/498 ; H01L23/00 ; H01L25/065 ; H01L25/00

Abstract:
Embodiments of the application provide a vertical interconnection structure and a manufacturing method thereof, a packaged chip, and a chip packaging method. Conductive pillars are formed on a first surface of a substrate. A first insulated support layer wrapping the conductive pillars is formed on the first surface of the substrate. The conductive pillars are located in the first insulated support layer. An upper surface of the conductive pillar that is away from the substrate is not covered by the first insulated support layer. Then the substrate is removed.
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Information query
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