Invention Grant
- Patent Title: Semiconductor structure and manufacturing method for the same
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Application No.: US17688961Application Date: 2022-03-08
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Publication No.: US11776873B2Publication Date: 2023-10-03
- Inventor: Dai-Ying Lee , Ming-Hsiu Lee
- Applicant: MACRONIX INTERNATIONAL CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McClure, Qualey & Rodack, LLP
- The original application number of the division: US16826330 2020.03.23
- Main IPC: H01L21/48
- IPC: H01L21/48 ; H01L21/768 ; H01L23/40

Abstract:
A semiconductor structure and a manufacturing method for the same. The semiconductor structure includes a plug element and a via element. The plug element includes a tungsten plug. The plug element has a plug size in a lateral direction. The via element is electrically connected on the plug element. The via element is non-symmetrical with respect a center line of the plug element extending along a longitudinal direction. The via element has a via size in the lateral direction. The plug size is bigger than the via size.
Public/Granted literature
- US20220199490A1 SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD FOR THE SAME Public/Granted day:2022-06-23
Information query
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