Invention Grant
- Patent Title: Substrate bonding apparatus, manufacturing system, and semiconductor device manufacturing method
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Application No.: US16815157Application Date: 2020-03-11
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Publication No.: US11776931B2Publication Date: 2023-10-03
- Inventor: Sho Kawadahara
- Applicant: Kioxia Corporation
- Applicant Address: JP Minato-ku
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP 19162027 2019.09.05
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L21/677 ; H01L21/68 ; H01L21/67

Abstract:
According to one embodiment, there is provided a substrate bonding apparatus including a first chucking stage, a second chucking stage, and an alignment unit. The first chucking stage is configured to chuck a first substrate. The second chucking stage is disposed facing the first chucking stage. The second chucking stage is configured to chuck a second substrate. The alignment unit is configured to be inserted between the first chucking stage and the second chucking stage. The alignment unit includes a base body, a first detection element, and a second detection element. The base body includes a first main face and a second main face opposite to the first main face. The first detection element is disposed on the first main face. The second detection element is disposed on the second main face.
Public/Granted literature
- US20210074670A1 SUBSTRATE BONDING APPARATUS, MANUFACTURING SYSTEM, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD Public/Granted day:2021-03-11
Information query
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