Invention Grant
- Patent Title: SiC trench MOSFET with low on-resistance and switching loss
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Application No.: US17321537Application Date: 2021-05-17
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Publication No.: US11777000B2Publication Date: 2023-10-03
- Inventor: Fu-Yuan Hsieh
- Applicant: Nami MOS CO., LTD.
- Applicant Address: TW New Taipei
- Assignee: NAMI MOS CO., LTD.
- Current Assignee: NAMI MOS CO., LTD.
- Current Assignee Address: TW New Taipei
- Agency: BACON & THOMAS, PLLC
- Main IPC: H01L29/10
- IPC: H01L29/10 ; H01L29/06 ; H01L29/423 ; H01L29/78 ; H01L29/66 ; H01L29/739 ; H01L21/04 ; H01L29/16

Abstract:
An improved SiC trench MOSFET having first and second type gate trenches for formation of a gate electrode, and a grounded P-shield region under the gate electrode for gate oxide electric-field reduction is disclosed. The gate electrodes are disposed into the first type gate trench having a thick oxide layer on trench bottom. The grounded P-shield region surrounding the second type gate trench filled up with the thick oxide layer is connected with a source metal through a grounded P region. The device further comprises a current spreading region surrounding the first type gate trench for on-resistance reduction.
Public/Granted literature
- US20220367636A1 SIC TRENCH MOSFET WITH LOW ON-RESISTANCE AND SWITCHING LOSS Public/Granted day:2022-11-17
Information query
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