Invention Grant
- Patent Title: Artifact compensation mechanism
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Application No.: US17506279Application Date: 2021-10-20
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Publication No.: US11778123B2Publication Date: 2023-10-03
- Inventor: Mikel Stanich , Walter F. Kailey , Nikita Gurudath , Ziling Zhang , Brandon Skogen
- Applicant: Mikel Stanich , Walter F. Kailey , Nikita Gurudath , Ziling Zhang , Brandon Skogen
- Applicant Address: US CO Boulder
- Assignee: Ricoh Company, Ltd.
- Current Assignee: Ricoh Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Jaffery Watson Mendonsa & Hamilton LLP
- Main IPC: H04N1/52
- IPC: H04N1/52

Abstract:
A system is disclosed. The system includes at least one physical memory device to store compensation logic and one or more processors coupled with the at least one physical memory device to execute the compensation logic to generate first ink deposition function representing a first output ink amount versus input digital count for each of a plurality of color planes without pel forming element artifacts, generate second ink deposition function representing a second output ink amount versus input digital count for each of the plurality of color planes with the pel forming element artifacts and generate compensated halftones for each of the plurality of color planes based on the first ink deposition function and the second ink deposition function.
Public/Granted literature
- US20230120258A1 ARTIFACT COMPENSATION MECHANISM Public/Granted day:2023-04-20
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