Invention Grant
- Patent Title: Memory device having 2-transistor vertical memory cell and separate read and write gates
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Application No.: US17388678Application Date: 2021-07-29
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Publication No.: US11778806B2Publication Date: 2023-10-03
- Inventor: Eric S. Carman , Durai Vishak Nirmal Ramaswamy , Richard E Fackenthal , Kamal M. Karda , Karthik Sarpatwari , Haitao Liu , Duane R. Mills , Christian Caillat
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Schwegman Lundberg & Woessner, P.A.
- Main IPC: G11C11/34
- IPC: G11C11/34 ; H10B12/00 ; H01L29/24 ; G11C11/4074 ; G11C11/408 ; G11C11/4096 ; G11C11/4094 ; H10B41/10 ; H10B41/27 ; H10B41/35 ; H10B41/40

Abstract:
Some embodiments include apparatuses and methods of operating such apparatuses. One of such apparatuses includes a data line, a conductive region, and a memory cell including a first transistor and a second transistor. The first transistor includes a first channel region coupled to the data line and the conductive region, a charge storage structure, and a first gate. The second transistor includes a second channel region coupled to the data line and the charge storage structure, and a second gate. The first gate is electrically separated from the second gate and opposite from the second gate in a direction from the first channel region to the second channel region.
Public/Granted literature
- US20230031904A1 MEMORY DEVICE HAVING 2-TRANSISTOR VERTICAL MEMORY CELL AND SEPARATE READ AND WRITE GATES Public/Granted day:2023-02-02
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