Invention Grant
- Patent Title: 3D nanochannel interleaved devices
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Application No.: US16704878Application Date: 2019-12-05
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Publication No.: US11779918B2Publication Date: 2023-10-10
- Inventor: Lawrence A. Clevenger , Kangguo Cheng , Donald Canaperi , Shawn Peter Fetterolf
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Michael J. Chang, LLC
- Agent Kristofer Haggerty
- Main IPC: B01L3/00
- IPC: B01L3/00 ; B82B1/00 ; B82B3/00

Abstract:
3D nanochannel interleaved devices for molecular manipulation are provided. In one aspect, a method of forming a device includes: forming a pattern on a substrate of alternating mandrels and spacers alongside the mandrels; selectively removing the mandrels from a front portion of the pattern forming gaps between the spacers; selectively removing the spacers from a back portion of the pattern forming gaps between the mandrels; filling i) the gaps between the spacers with a conductor to form first electrodes and ii) the gaps between the mandrels with the conductor to form second electrodes; and etching the mandrels and the spacers in a central portion of the pattern to form a channel (e.g., a nanochannel) between the first electrodes and the second electrodes, wherein the first electrodes and the second electrodes are offset from one another across the channel, i.e., interleaved. A device formed by the method is also provided.
Public/Granted literature
- US20210170399A1 3D Nanochannel Interleaved Devices Public/Granted day:2021-06-10
Information query
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