Invention Grant
- Patent Title: Transparent illumination photolithography methods and systems
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Application No.: US16362540Application Date: 2019-03-22
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Publication No.: US11782204B2Publication Date: 2023-10-10
- Inventor: Kevin Donahue
- Applicant: NanoPath, Inc.
- Applicant Address: US MA Leominster
- Assignee: NanoPath, Inc.
- Current Assignee: NanoPath, Inc.
- Current Assignee Address: US MA Leominster
- Agency: Foley & Lardner LLP
- Main IPC: F21V8/00
- IPC: F21V8/00 ; G02C11/04 ; G02B5/02 ; G02B27/01

Abstract:
A method of forming a one-way see-through illumination device including a light guide and a pattern of pixels on a surface of the light guide. The method includes forming pixel wells corresponding to the pixels, via a formation method including photolithography, on the surface of the light guide. The pixels, including a light diffusing layer and a light reflecting layer, are formed using the pixel wells, wherein the pattern of pixels and the light guide are arranged to generate transparent illumination by the frustration of total internal reflection of light injected into the light guide.
Public/Granted literature
- US20190293860A1 TRANSPARENT ILLUMINATION PHOTOLITHOGRAPHY METHODS AND SYSTEMS Public/Granted day:2019-09-26
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