Salt and photoresist composition containing the same

Invention Grant

US11782342B2 Salt and photoresist composition containing the same 有权

Patent Title: Salt and photoresist composition containing the same
Application No.: US16149530

Application Date: 2018-10-02
Publication No.: US11782342B2

Publication Date: 2023-10-10
Inventor: Katsuhiro Komuro , Yuki Takahashi , Koji Ichikawa
Applicant: Sumitomo Chemical Company, Limited
Applicant Address: JP Tokyo
Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
Current Assignee Address: JP Tokyo
Agency: BUCHANAN INGERSOLL & ROONEY PC
Priority: JP 17194866 2017.10.05
Main IPC: G03F7/004
IPC: G03F7/004 ; G03F7/033 ; G03F7/16 ; C07C381/12 ; G03F7/20 ; G03F7/38 ; G03F7/32 ; C07F7/18 ; C07D327/06 ; G03F7/039 ; C07D327/08 ; G03F7/075

Abstract:

A salt represented by the formula (I):

Public/Granted literature

Information query

Espacenet

IPC分类:

G	物理
G03	摄影术；电影术；利用了光波以外其他波的类似技术；电记录术；全息摄影术
G03F	图纹面的照相制版工艺，例如，印刷工艺、半导体器件的加工工艺；其所用材料；其所用原版；其所用专用设备（照相排版装置入B41B；为摄影用的感光材料或处理入G03C；电记录、感光层或处理入G03G）
G03F7/00	图纹面，例如，印刷表面的照相制版如光刻工艺；图纹面照相制版用的材料，如：含光致抗蚀剂的材料；图纹面照相制版的专用设备（用于特殊工艺的光致抗蚀剂结构见相关的位置，例如，B44C，H01L，例如，H01L21/00，H05K）
G03F7/004	.感光材料（G03F7/12，G03F7/14优先）