Invention Grant
- Patent Title: Substrate processing apparatus, method of monitoring abnormality of substrate processing apparatus, and recording medium
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Application No.: US16807601Application Date: 2020-03-03
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Publication No.: US11782425B2Publication Date: 2023-10-10
- Inventor: Kazuyoshi Yamamoto , Kazuhide Asai , Hidemoto Hayashihara , Mitsuru Fukuda , Kayoko Yashiki , Takayuki Kawagishi , Hiroyuki Iwakura
- Applicant: KOKUSAI ELECTRIC CORPORATION
- Applicant Address: JP Tokyo
- Assignee: KOKUSAI ELECTRIC CORPORATION
- Current Assignee: KOKUSAI ELECTRIC CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Volpe Koenig
- Main IPC: G05B19/418
- IPC: G05B19/418

Abstract:
There is provided a configuration that includes: a main controller configured to, when executing a process recipe including a specific step of executing a sub-recipe, control a process controller to execute the sub-recipe a predetermined number of times to perform a predetermined process to a substrate: and a device management controller configured to collect device data during an execution of the process, recipe and store the device data in a storage part. The device management controller is further configured to: search the storage part; acquire the device data in a designated step among respective steps constituting the sub-recipe for a number of times of execution of the sub-recipe; calculate a first standard deviation of the device data acquired for the number of times of execution; and compare the first standard deviation with a threshold value and generate an alarm when the first standard deviation exceeds the threshold value.
Information query
IPC分类: