Invention Grant
- Patent Title: Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films
-
Application No.: US17666686Application Date: 2022-02-08
-
Publication No.: US11784041B2Publication Date: 2023-10-10
- Inventor: Daehyeon Kim , Junhyun Song , Wontae Noh , Venkateswara R. Pallem
- Applicant: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude , American Air Liquide, Inc.
- Applicant Address: FR CA Paris
- Assignee: L'Air Liquide, Sociéte Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude,American Air Liquide, Inc.
- Current Assignee: L'Air Liquide, Sociéte Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude,American Air Liquide, Inc.
- Current Assignee Address: FR Paris; US CA Fremont
- Agent Allen E. White
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C07F5/00 ; C23C16/40
Abstract:
The disclosed lanthanide precursor compounds include a cyclopentadienyl ligand having at least one aliphatic group as a substituent and at least one bidentate ligand. These precursors are suitable for depositing lanthanide containing films.
Public/Granted literature
- US20230253200A1 PREPARATION OF LANTHANIDE-CONTAINING PRECURSORS AND DEPOSITION OF LANTHANIDE-CONTAINING FILMS Public/Granted day:2023-08-10
Information query
IPC分类:
