Invention Grant
- Patent Title: Field effect transistor and method for manufacturing the same
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Application No.: US17612439Application Date: 2019-06-04
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Publication No.: US11784232B2Publication Date: 2023-10-10
- Inventor: Takuya Tsutsumi , Hideaki Matsuzaki
- Applicant: Nippon Telegraph and Telephone Corporation
- Applicant Address: JP Tokyo
- Assignee: Nippon Telegraph and Telephone Corporation
- Current Assignee: Nippon Telegraph and Telephone Corporation
- Current Assignee Address: JP Tokyo
- Agency: Slater Matsil, LLP
- International Application: PCT/JP2019/022209 2019.06.04
- International Announcement: WO2020/245922A 2020.12.10
- Date entered country: 2021-11-18
- Main IPC: H01L29/423
- IPC: H01L29/423 ; H01L29/10 ; H01L29/66

Abstract:
A gate opening, a plurality of first openings arranged in a gate widthwise direction and having a reed shape, a second opening connecting the adjacent first openings, and a third opening connected to a side away from the arrangement of the first opening at an end of the arrangement are formed in an insulation layer. An ohmic cap layer is etched via the openings to form an asymmetric recess region.
Public/Granted literature
- US20220208980A1 Field Effect Transistor and Method for Manufacturing the Same Public/Granted day:2022-06-30
Information query
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