Invention Grant
- Patent Title: Three-dimensional semiconductor memory devices
-
Application No.: US17360349Application Date: 2021-06-28
-
Publication No.: US11785768B2Publication Date: 2023-10-10
- Inventor: Euntaek Jung , Joongshik Shin , Dongyoun Shin
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR 20180049926 2018.04.30
- Main IPC: H01L27/11519
- IPC: H01L27/11519 ; H10B41/27 ; H10B41/10 ; H10B41/35 ; H10B43/10 ; H10B43/27 ; H10B43/35

Abstract:
A three-dimensional semiconductor memory device includes a substrate, an electrode structure including a plurality of gate electrodes sequentially stacked on the substrate in a first direction that extends perpendicular to an upper surface of the substrate, a source conductive pattern between the substrate and the electrode structure, a vertical semiconductor pattern penetrating the electrode structure and the source conductive pattern, and a data storage pattern extending in the first direction between the vertical semiconductor pattern and the electrode structure. A lower surface of the data storage pattern contacts the source conductive pattern. A portion of the lower surface of the data storage pattern is at a different height from the upper surface of the substrate, in relation to a height of another portion of the lower surface of the data storage pattern from the upper surface of the substrate.
Public/Granted literature
- US20210327892A1 THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICES Public/Granted day:2021-10-21
Information query
IPC分类: