- Patent Title: Through array contact structure of three-dimensional memory device
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Application No.: US17944490Application Date: 2022-09-14
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Publication No.: US11785776B2Publication Date: 2023-10-10
- Inventor: Zhenyu Lu , Wenguang Shi , Guanping Wu , Xianjin Wan , Baoyou Chen
- Applicant: Yangtze Memory Technologies Co., Ltd.
- Applicant Address: CN Hubei
- Assignee: Yangtze Memory Technologies Co., Ltd.
- Current Assignee: Yangtze Memory Technologies Co., Ltd.
- Current Assignee Address: CN Hubei
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: CN 1710135329.2 2017.03.08 CN 1710135654.9 2017.03.08
- Main IPC: H10B43/50
- IPC: H10B43/50 ; H10B43/10 ; H10B43/27 ; H10B43/40 ; H01L23/522 ; H01L23/535 ; H10B43/35

Abstract:
Embodiments of through array contact structures of a 3D memory device is disclosed. The 3D NAND memory device includes an alternating layer stack disposed on a substrate. The alternating layer stack includes a first region including an alternating dielectric stack, and a second region including an alternating conductor/dielectric stack. The memory device further comprises a barrier structure extending vertically through the alternating layer stack to laterally separate the first region from the second region, and multiple through array contacts in the first region each extending vertically through the alternating dielectric stack. At least one through array contact is electrically connected with a peripheral circuit.
Public/Granted literature
- US20230005950A1 THROUGH ARRAY CONTACT STRUCTURE OF THREE-DIMENSIONAL MEMORY DEVICE Public/Granted day:2023-01-05
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