Invention Grant
- Patent Title: Charged particle beam apparatus
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Application No.: US17595282Application Date: 2019-05-15
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Publication No.: US11798776B2Publication Date: 2023-10-24
- Inventor: Shunichi Motomura , Tsunenori Nomaguchi
- Applicant: Hitachi High-Tech Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Tech Corporation
- Current Assignee: Hitachi High-Tech Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- International Application: PCT/JP2019/019234 2019.05.15
- International Announcement: WO2020/230285A 2020.11.19
- Date entered country: 2021-11-12
- Main IPC: H01J37/09
- IPC: H01J37/09 ; H01J37/153 ; H01J37/244

Abstract:
Provided is a charged particle beam apparatus capable of stably obtaining a spherical aberration correction effect. The charged particle beam apparatus includes: a charged particle beam aperture stop 121 and an electrode 122 that are arranged on an optical axis between the charged particle beam source 101 and the objective lens 105; and a power supply 108 that applies a voltage between the charged particle beam aperture stop 121 and the electrode 122, in which the voltage that is applied from the electrode to the charged particle beam aperture stop by the power supply is a voltage having a polarity opposite to a charge of the charged particle beam, the electrode 122 includes an annular aperture 205, and the charged particle beam aperture stop 121 includes a plurality of apertures 201 that are arranged at positions overlapping the annular aperture 205 of the electrode 122 when viewed in a direction Z along the optical axis.
Public/Granted literature
- US20220238296A1 Charged Particle Beam Apparatus Public/Granted day:2022-07-28
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