Invention Grant
- Patent Title: Liquid processing apparatus and liquid processing method
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Application No.: US17354128Application Date: 2021-06-22
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Publication No.: US11798819B2Publication Date: 2023-10-24
- Inventor: Kazuki Kosai , Yusuke Takamatsu , Taisei Inoue
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: JP 20107773 2020.06.23
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/02 ; B08B3/14 ; B08B13/00 ; B08B3/08

Abstract:
A liquid processing apparatus includes a storage tank, a circulation line, a supply line, a return line and at least one filter. The storage tank stores a processing liquid therein. Through the circulation line, the processing liquid sent from the storage tank is returned back into the storage tank. The supply line connects the circulation line and a supply configured to supply the processing liquid onto a substrate. The return line is connected to the supply line, and the processing liquid is returned back into the storage tank from the supply line through the return line. The filter is provided in at least one of the supply line on an upstream side of a connection point between the return line and the supply line or the return line, and is configured to remove a foreign substance in the processing liquid.
Public/Granted literature
- US20210398828A1 LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD Public/Granted day:2021-12-23
Information query
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