Invention Grant
- Patent Title: Mask device and manufacturing method thereof, evaporation method and display device
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Application No.: US16965068Application Date: 2019-09-12
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Publication No.: US11800780B2Publication Date: 2023-10-24
- Inventor: Fengli Ji
- Applicant: ORDOS YUANSHENG OPTOELECTRONICS CO., LTD. , BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Inner Mongolia
- Assignee: ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.,BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Inner Mongolia; CN Beijing
- Agency: Leason Ellis LLP
- International Application: PCT/CN2019/105713 2019.09.12
- International Announcement: WO2021/046807A 2021.03.18
- Date entered country: 2020-07-27
- Main IPC: H01L51/00
- IPC: H01L51/00 ; C23C14/04 ; H10K71/16 ; C23C14/12 ; C23C14/24 ; H10K71/00

Abstract:
Disclosed are a mask device, a manufacturing method thereof, an evaporation method and a display device. The mask device includes: a mask frame; at least one first mask strip extending in a first direction, at least one second mask strip extending in a second direction, and a first mask plate extending in the first direction, which are fixed on the mask frame. The first direction crosses the second direction, the first mask strip and the second mask strip are intersected to define at least one mask opening, the first mask plate includes a mask pattern region, and the mask pattern region includes a first group of through holes covered by an orthographic projection of the at least one mask opening on the first mask plate, and a second group of through holes covered by an orthographic projection of the first and second mask strips on the first mask plate.
Public/Granted literature
- US20220384726A1 MASK DEVICE AND MANUFACTURING METHOD THEREOF, EVAPORATION METHOD AND DISPLAY DEVICE Public/Granted day:2022-12-01
Information query
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