Invention Grant
- Patent Title: Dielectric substrate and method of forming the same
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Application No.: US18157918Application Date: 2023-01-23
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Publication No.: US11805600B2Publication Date: 2023-10-31
- Inventor: Jennifer Adamchuk , Gerard T. Buss , Theresa M. Besozzi
- Applicant: SAINT-GOBAIN PERFORMANCE PLASTICS CORPORATION
- Applicant Address: US OH Solon
- Assignee: SAINT-GOBAIN PERFORMANCE PLASTICS CORPORATION
- Current Assignee: SAINT-GOBAIN PERFORMANCE PLASTICS CORPORATION
- Current Assignee Address: US OH Solon
- Agency: Abel Schillinger, LLP
- Agent Chi Suk Kim
- Main IPC: H05K1/03
- IPC: H05K1/03 ; H05K1/09 ; H05K1/05

Abstract:
The present disclosure relates to a dielectric substrate that may include a polyimide layer and a first filled polymer layer overlying the polyimide layer. The first filled polymer layer may include a resin matrix component, and a first ceramic filler component. The first ceramic filler component may include a first filler material. The first filler material may further have a mean particle size of at not greater than about 10 microns.
Public/Granted literature
- US20230164914A1 DIELECTRIC SUBSTRATE AND METHOD OF FORMING THE SAME Public/Granted day:2023-05-25
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